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TEQWIPE S113 1/20

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TEQWIPE S113 1/20

Phenoxyethanol, Benzoic acid, Dehydroacetic acid,Benzalkonium chloride, Glycerin, Propylene Glycol, Polysorbate 20, Tocopheryl Acetate, Tetrasodium EDTA, D-Penthanol,Citric acid, Cocamidopropyl Betaine, Cetearyl Isononanoate, Ceteareth-20, Cetearyl Alcohol, Glyceryl Stearate, Glycerin, Ceteareth-12, Cetyl Palmitate

TEQWIPE S113 1/20 is concentrated antibacterial wet wipe base. It has been developed to provide effective protection against microorganisms and is especially suitable for formulating wet wipes to be produced for this purpose. Recommended use: 2,0%. Suitable pH: <5,5


Sectors

Cosmetic



Main Categories

Personal Hygiene



Groups

Single Wet Wipes, Multiple Wet Wipes



Functions